Relevant parameters of excimer laser gas
One of the important characteristics of the gas laser is that the working material of the laser is a mixture or a single pure gas. Therefore, there are special requirements for the purity of the components of the laser mixture. The steel cylinder packaging the mixture must also be dried before filling to prevent contamination of the mixture. If helium (He) neon (Ne) laser is used as the first generation of gas laser, and carbon dioxide laser is the second generation of gas laser, the krypton fluoride (KrF) laser that will be widely used in the semiconductor manufacturing field can be called the third generation laser.
Other names: | Argon fluoride laser gas(193nm);Krypton fluoride laser gas(248nm);(308nm)Xenon chloride laser gas | |
Product type: | ArF,KrF,XeCl,5%F2/He, Kr/Ne,F2/Kr/Ne,Ar/Ne,F2/Ar/Ne | |
UN NO. : | UN1956 | |
Cylinder volume: | 11L,16L,20L,49L,50L | |
Valve type: | CGA679,DIN 8,DIN 14 | |
High power excimer laser gas | ||
Available wavelength | 193 nm | ArF |
248 nm | KrF | |
308 nm | XeCl | |
450nm~520nm | XeF | |
Maximum UV power | 540 W | |
Maximum ultraviolet energy | 1100 mj | |
Repetition frequency | Variable, 1~600 Hz | |
Pulse stability | 0.5%~1%,rms | |
Long-term drift | 0.1%~0.5%,rms | |
Beam distribution | Uniform, Flat top | |
Pulse width | 10~20 ns | |
Relative gas purity | F2, 99.9% | |
Ar, 99.9999% | ||
He, 99.9999% | ||
Ne, 99.9999% | ||
HCl, Electronic | ||
Kr, 99.999% | ||
Xe, 99.999% | ||
O2, 99.999% | ||
H2, 99.999% | ||
Gas operating temperature | - 40 0C ~ + 74 0C | |
Gas pressure | 520 psig ~ 2400 psig / 35 Bar ~ 167 Bar | |
Cylinder specification | 10L、16L、20L、50L | |
Valve interface | CGA 679、CGA 330、CGA 580、DIN 6、DIN 8、DIN 14 |